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  • Rare Earth metal target
       
  Model： Rare Earth metal target  
  Origin： China  
  Category： > Chemicals > Coatings  
  Keywords： Y  target  sputtering  La  Ce  Gd  Tb  Ho  Er  Yb  
  Price：  
  Min. Order： 0 / USD  
  • Product Description
  • Yttrium (Y), Lanthanum (La), Cerium (Ce), Praseodymium (Pr), Neodymium (Nd), Samarium (Sm), Gadolinium (Gd), Terbium (Tb), Dysprosium (Dy), Holmium (Ho), Erbium (Er), Thulium (Tm), Ytterbium (Yb), Lutetium (Lu), Scandium (Sc)


    Serve as the raw materials for the sputter deposition of a variety of thin films and coatings used in the microelectronic, flat panel display, data storage, optical glass coating, and other industries, the core process technologies used in coating material and target manufacturing include:
    Casting (vacuum or atmospheric), rolling, forging (hot / cold), pressing (cold, hot, uniaxial or isotropic), sintering, spraying (plasma, wire). CAM runs all these process technologies, including cutting, milling, sawing, grinding, etc.

    1.) Oxide sputtering target:
    La2O3, CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, Y2O3, Ta2O5, Nb2O5, Ga2O3, V2O5, ZrO2 doped with Ti, WO3, HfO2, MgO, Al2O3, Indium Tin Oxide, ITO (In2O3-SnO2), ZnO, Al2O3 doped ZnO (AZO), Ga2O3 doped ZnO (GZO), La0.67Sr0.33MnO3 (LSMO), ZrO2-Y2O3 stabilized (YSZ), ZrO2+Ti, ZrO2+SiO2, Bi2O3, Cr2O3, MoO, MoO3, NiO, SiO, Cr-SiO, SiO2, TiO, TiO2, TiO2-Nb2O5, Ti2O3, Ti3O5, CuO/Al2O3, Sb2O3, BaO, BaTiO3, CaO, Fe2O3, Fe3O4, PbO, PbTiO3, PbZrO3, LiNbO3, SrO, SrTiO3, SrZrO3, SrBaTiO3, PZT (Plumbum Zirconate Titanate), SrRuO3, LaNiO3, InGaZnO, CuInO2.

    2.) (Boride, Carbide, Nitride, Fluoride, Silicide, Sulfide) sputtering target
    LaB6, ZrB2, CrB2, TiB2, HfB2, Mo2B5, TaB2, NbB2, W2B, WB, VB2
    TiC, SiC, WC, WC-Co, B4C, TaC, ZrC, Cr3C2, HfC, Mo2C, VC
    LaN, CeN, PrN, NdN, SmN, EuN, GdN, TbN, DyN, HoN, ErN, TmN, YbN, LuN, ScN, YN, Si3N4, AlN, BN, BN/SiC mixture, HfN, TaN, NbN, ZrN, TiN, VN
    LaF3, CeF3, NdF3, YF3, NaF, KF, BaF2, AlF3, LiF, CaF2, SrF3, SrF2, MgF2
    CoSi2, Mo5Si3, MoSi2, Ta5Si3, TaSi2, Nb5Si3, NbSi2, CrSi2, Cr3Si, HfSi2, TiSi2, Ti5Si3, ZrSi2, WSi2, VSi2, V3Si, NiSi,
    CdS, ZnS, ZnS:Mn, In2S3, Sb2S3, PbS, MoS2, TaS2, WS2

    3.) Metal sputtering target:
    Gold, Au, Silver, Ag, Osmium, Os, Platinum, Pt, Palladium, Pd, Iridium, Ir, Ruthenium, Ru, Rhenium, Re, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y, Silicon, Si, Tellurium, Te, Bismuth, Bi, Tin, Sn, Zinc, Zn, Sulphur, S, Graphite, C, Boron, B, Lead, Pb, Antimony, Sb, Selenium, Se, Chromium, Cr, Cobalt, Co, Aluminum, Al, Nickel, Ni, Titanium, Ti, Tungsten, W, Molybdenum, Mo, Tantalum, Ta, Niobium, Nb, Zirconium, Zr, Hafnium, Hf, Vanadium, V, Germanium, Ge, Indium In, Copper, Cu, Iron, Fe, Manganese, Mn, , Magnesium, Mg, Barium, Ba, Cadmium, Cd, Calcium, Ca, Strontium, Sr.

    4.) Alloy sputtering target:
    NiYb, Ni2Yb, Ni3Yb, Ni-Yb, LaNi, La-Ni, Co-Ni, V-Ni, Cr-Ni, Ti-Ni, Fe-Ni, Co-Ni-Cr, Ni-Zr-Y, Ni-Gd-Ce, Co-Cr-Ta, Ho-Cu, Ce-Cu, Cu84Zn14Ni4, Fe50Mn50, Ni81Fe19, Ce-Gd, Sm-Fe, Sm-Co, Sm-Zr, Gd-Fe, Fe-Hf, Tb-Fe, Dy-Fe, Dy-Co, Gd-Fe, Gd-Fe-Co, Dy-Fe-Co, Tb-Fe-Co, Nd-Fe-Co, Nb-Zr, Zr-Al, AlNiScGdZr, Al-Nd, Al-Ta, Al-V, Al-Mo, Al-Si, Al-Cu, Al-Si-Cu, Al-Ti, Al-Ag, Al-Mg, Al-Mg-Si, Al-Si-Cu, Zn-Al, Ce-Gd, Ce-Sm, CoZr, CoCr, CoNi, CoPt, CoNiCr, CoNiPt, Co-Fe, FeCoB, CoTaZr, CoNbZr, CoCrMo, CrV, CrB, CrSi, Cr-Cu, In-Sb, InAs, InP, InSn, MnFe, MnNi, NdDyFeCo, Ni-Cr, Ni-Mn, Ni-Cr-Si, Ni-Cr-Fe, Ni-Fe, Ni-Ti, Ni-V, Ni-Al, TbGdFeCo, TiAl, Ti-Si, Ti-Al, Ti-Al-Y, Ti-Al-V, Ti-Ni, Ti-Zr, TiSi2, W-Ti, W-Si, V-Al, Zr-Ti, Zr-Ni, Zr-Nb, Zr-Al, Zr-Cu, Zr-Y

    EVAPORATION MATERIALS
    La2O3, CeO2, Pr6O11, Nd2O3, Sm2O3, Gd2O3, Dy2O3, Er2O3, Sm2O3, Yb2O3, Y2O3, LaF3, CeF3, PrF3, NdF3, SmF3, GdF3, DyF3, ErF3, YbF3, ScF3, YF3, HfO2, CaF2, ZnS, CdS, SiO2, HfO2, ZrO2, TiO2, TiO, Ti2O3, Ti3O5, Ta2O5, Nb2O5, SiO2, Al2O3, MgO, ZnO, WO3, Bi2O3, Sb2O3, Cr2O3, NiO, CuO, Fe2O3, V2O5, BaTiO3, SrTiO3, PrTiO3, LaTiO3, MgF2, BaF2, SrF3, CaF2, KF, NaF, ZnS, CdS, ZnSe.
           
  • Contact Information of this Company
Company Name︰ Cathay Advanced Materials Limited  
Company Address︰ B6208,Jinbao chuangye Jiayuan, Zhongkai High Technology Development Zone, Guangdong, 516006, China  
Company Phone︰ +86 75 22627166  
Company Fax︰ +86 75 22627926  
Contact Person︰ Tao Zhen ( manager>
 
Mobile︰  
Website︰ http://www.cathaymaterials.com  
         
  • Copmany Name: Cathay Advanced Materials Limited    Contact: Tao Zhen
  • Address: B6208,Jinbao chuangye Jiayuan, Zhongkai High Technology Development Zone, Guangdong, 516006, China
  • TeL: +86 75 22627166   Fax: +86 75 22627926
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